Updates in Advanced Lithography
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the so...
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| Format: | Électronique Chapitre de livre |
| Langue: | anglais |
| Publié: |
IntechOpen
2013
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| Sujets: | |
| Accès en ligne: | DOAB: download the publication DOAB: description of the publication |
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| Résumé: | Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications. |
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| Description matérielle: | 1 electronic resource (262 p.) |
| ISBN: | 3348 9789535111757 9789535157090 |
| Accès: | Open Access |