Current Research in Thin Film Deposition Applications, Theory, Processing, and Characterisation

• Andere auteurs: Birney, Ross (Redacteur)
• Formaat: Elektronisch Hoofdstuk
• Taal: Engels
• Gepubliceerd in: Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
• Onderwerpen: Technology: general issues; PECVD; plasma diagnostics; nc-Si:H; RF-PECVD; Fourier-transform infrared spectroscopy (FTIR); quadruple mass spectrometry (QMS); optical emission spectroscopy (OES); X-ray diffraction spectroscopy (XRD); micro hollow glass spheres (MHGS); solid micro glass spheres (SMGS); liquid phase deposition (LPD); aluminum coating; β-Ga2O3; MOCVD; VI/III ratio; scandium stabilized zirconia thin films; e-beam physical vapor deposition; thin films ceramics; Raman spectroscopy; X-ray diffraction; initiated chemical vapor deposition (iCVD); superhydrophobic; fluoropolymer; thin film; atomic layer deposition; nanomechanics; Young's modulus; shear modulus; resonant frequency; Q-factor; microcantilevers; internal stress; nickel-chromium; thin film thermocouples; physical vapor deposition; flat film extrusion; foil quality; MgF2; color center absorption; density; crystal frequency; stress; adhesion; polarization controlling; dual functional-metalens; focusing; splitting; PVD coatings; nanoindentation; brittle cracking; fracture toughness; diamond coatings; residual stresses; interfacial fatigue strength; annealing; milling; n/a
• Online toegang: DOAB: download the publication; DOAB: description of the publication

Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of...