Nanoimprint Lithography Technology and Applications

Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes aro...

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Bibliographic Details
Other Authors: Mühlberger, Michael (Editor)
Format: Electronic Book Chapter
Language:English
Published: Basel MDPI - Multidisciplinary Digital Publishing Institute 2022
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Online Access:DOAB: download the publication
DOAB: description of the publication
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245 1 0 |a Nanoimprint Lithography Technology and Applications 
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520 |a Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around the world. One of the exciting things about nanoimprinting process is its remarkable versatility and the broad range of applications. This reprint includes ten articles, which represent a small glimpse of the challenges and possibilities of this technology. Six contributions deal with nanoimprint processes aiming at specific applications, while the other four papers focus on more general aspects of nanoimprint processes or present novel materials. Several different types of nanoimprint processes are used: plate-to-plate, roll-to-plate, and roll-to-roll. Plate-to-plate NIL here also includes the use of soft and flexible stamps. The application fields in this reprint are broad and can be identified as plasmonics, superhydrophibicity, biomimetics, optics/datacom, and life sciences, showing the broad applicability of nanoimprinting. The sections on the nanoimprint process discuss filling and wetting aspects during nanoimprinting as well as materials for stamps and imprinting. 
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546 |a English 
650 7 |a Technology: general issues  |2 bicssc 
653 |a nanoimprint lithography 
653 |a polymer 
653 |a formulation development 
653 |a surface chemistry 
653 |a click chemistry 
653 |a plasmons 
653 |a Bragg SPPs 
653 |a angle of incidence 
653 |a grating 
653 |a organic solar cell 
653 |a ultraviolet nanoimprint lithography 
653 |a durability 
653 |a anisotropy 
653 |a contact angle 
653 |a line and space 
653 |a high aspect ratio micro-structure 
653 |a roll-to-plate nanoimprint lithography 
653 |a superhydrophobic 
653 |a oleophobic 
653 |a biomimetic surface 
653 |a large-area patterning 
653 |a negligible residual layer 
653 |a partial cavity filling 
653 |a guiding chart 
653 |a defect avoidance 
653 |a hydrodynamic instabilities 
653 |a T-NIL 
653 |a UV-NIL 
653 |a el-UV-NIL 
653 |a el-T-NIL 
653 |a optical planar waveguides 
653 |a roll-to-plate R2P nanoimprinting 
653 |a UV-curable polymers 
653 |a inorganic-organic hybrid polymer 
653 |a optical losses 
653 |a SmartNIL 
653 |a R2R UV-NIL 
653 |a neuronal cell assay 
653 |a nanoimprint lithography (NIL) 
653 |a undercut features 
653 |a master 
653 |a Blu-Ray patterning 
653 |a reactive ion etching 
653 |a biomimetics 
653 |a morpho butterfly 
653 |a n/a 
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