Nanoimprint Lithography Technology and Applications

• Muut tekijät: Mühlberger, Michael (Toimittaja)
• Aineistotyyppi: Elektroninen Kirjan osa
• Kieli: englanti
• Julkaistu: Basel MDPI - Multidisciplinary Digital Publishing Institute 2022
• Aiheet: Technology: general issues; nanoimprint lithography; polymer; formulation development; surface chemistry; click chemistry; plasmons; Bragg SPPs; angle of incidence; grating; organic solar cell; ultraviolet nanoimprint lithography; durability; anisotropy; contact angle; line and space; high aspect ratio micro-structure; roll-to-plate nanoimprint lithography; superhydrophobic; oleophobic; biomimetic surface; large-area patterning; negligible residual layer; partial cavity filling; guiding chart; defect avoidance; hydrodynamic instabilities; T-NIL; UV-NIL; el-UV-NIL; el-T-NIL; optical planar waveguides; roll-to-plate R2P nanoimprinting; UV-curable polymers; inorganic-organic hybrid polymer; optical losses; SmartNIL; R2R UV-NIL; neuronal cell assay; nanoimprint lithography (NIL); undercut features; master; Blu-Ray patterning; reactive ion etching; biomimetics; morpho butterfly; n/a
• Linkit: DOAB: download the publication; DOAB: description of the publication

Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes aro...