Effect of chemical treatment of silicon surface on solar cell ZnO/p-Si
Abstract<br /> In this work solar cells of (ZnO/p-Si) prepared by depositing ZnO thin films by electrochemical deposition method (using aqueous solution of ZnCl2 & KCl) on silicon(111) wafer samples. The samples then annealed at (550°C, 1h), to study the effects of annealing and chemical e...
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| Format: | Book |
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College of Education for Pure Sciences,
2010-12-01T00:00:00Z.
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| Summary: | Abstract<br /> In this work solar cells of (ZnO/p-Si) prepared by depositing ZnO thin films by electrochemical deposition method (using aqueous solution of ZnCl2 & KCl) on silicon(111) wafer samples. The samples then annealed at (550°C, 1h), to study the effects of annealing and chemical etching by (HCl, HF), optical microscope, SEM-EDAX, X-Ray used as analysis techniques. The optical properties of prepared ZnO on glass substrate also studied. An optical band gab of (3.15eV) calculated. The transmittance of 80% found for the sample before annealing where it became 85% after annealing. Solar cells conversion efficiency of 2.4% were obtained for the cells etched with HCl, where it was 4.337% for HF etching. Where for solar cells samples prepared under texture treatment gave an increase in the efficiency to the 4.7%. |
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| Item Description: | 1812-125X 2664-2530 10.33899/edusj.2010.58463 |