Study The Surface Characterization of Anodic grow SiO2 nano Film on Si by using AFM
في هذا العمل تم دراسة خصائص السطح النانوي لغشاء SiO2 ذي سمك بحدود (2.3- 11.5) nm باستخدام المجهر القوة الذرية . تم أنماء غشاء نانوي من SiO2 على أرضية Si (100) نوع p-type وذلك باستخدام تقنية الأكسدة الانودية وباستعمال محلول (%75H2O+%25 isopropanol ) بوجود 0.1N KNO3 كاالكتروليت مساعد . ولوحظ من ال...
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Main Author: | Assim A. Issa (Author) |
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Format: | Book |
Published: |
University of Mosul-college of Basic Education,
2018-12-01T00:00:00Z.
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Online Access: | Connect to this object online. |
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