Thickness and crystalline properties of sputtered polycrystalline silicon thin film deposited on Teflon substrates / Shaiful Bakhtiar Hashim, Norhidayatul Hikmee Mahzan and Sukreen Hana Herman
A Polycrystalline silicon (poly-Si) thin film was successfully deposited on Teflon substrates at a room temperature using radiofrequency (RF) magnetron sputtering. The effects of sputtering pressure on the thickness and crystallinity properties of the thin films have been studied. Raman scattering s...
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| Formáid: | LEABHAR |
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2017.
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| Rochtain ar líne: | Link Metadata |
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Link Metadata3rd Floor Main Library
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A1234.567 |
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| Cóip 1 | Ar fáil |