Chemical Vapor Deposition for Nanotechnology

• Andere auteurs: Mandracci, Pietro (Redacteur)
• Formaat: Elektronisch Hoofdstuk
• Taal: Engels
• Gepubliceerd in: IntechOpen 2019
• Onderwerpen: Materials science; graphene, thin films, polymers, plasma, evaporation, growth mechanism
• Online toegang: DOAB: download the publication; DOAB: description of the publication

Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the...