Micro- and Nano-Fabrication by Metal Assisted Chemical Etching
Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates-Si, Ge, poly-Si, GaAs, and SiC-and using different catalysts-Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes...
Wedi'i Gadw mewn:
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Fformat: | Electronig Pennod Llyfr |
Iaith: | Saesneg |
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Basel, Switzerland
MDPI - Multidisciplinary Digital Publishing Institute
2021
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Mynediad Ar-lein: | DOAB: download the publication DOAB: description of the publication |
Tagiau: |
Ychwanegu Tag
Dim Tagiau, Byddwch y cyntaf i dagio'r cofnod hwn!
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Rhyngrwyd
DOAB: download the publicationDOAB: description of the publication
3rd Floor Main Library
Rhif Galw: |
A1234.567 |
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Copi 1 | Ar gael |