Micro- and Nano-Fabrication by Metal Assisted Chemical Etching

• Autres auteurs: Romano, Lucia (Éditeur intellectuel)
• Format: Électronique Chapitre de livre
• Langue: anglais
• Publié: Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
• Sujets: History of engineering & technology; porous silicon; Pd nanoparticles-assisted chemical etching; etching rate; ethanol electrooxidation; X-ray diffractive optics; zone plate; high aspect ratio nanostructures; metal-assisted chemical etching; electroless deposition; Al2O3 nanotube; ultra-high aspect ratio; gold (Au) metal assisted chemical etching; atomic layer deposition; anisotropic dry etching; silicon cones; metal assisted chemical etching; transversal pores; antireflection; black GaAs; photon recycling; X-ray grating interferometry; catalyst; silicon; gold electroplating; magnetically guided metal-assisted chemical etching; bulk Si etching; curved Si structure; catalyst encapsulation; n/a
• Accès en ligne: DOAB: download the publication; DOAB: description of the publication

Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates-Si, Ge, poly-Si, GaAs, and SiC-and using different catalysts-Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes...