Advances in Chemical Vapor Deposition

• Andere auteurs: Vernardou, Dimitra (Redacteur)
• Formaat: Elektronisch Hoofdstuk
• Taal: Engels
• Gepubliceerd in: Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
• Onderwerpen: Technology: general issues; APCVD; VO2; processing parameters; 2D; chemical vapor deposition; atomic layer deposition; aluminum oxide; aluminum tri-sec-butoxide; thin film; carbon nanotubes; residual gas adsorption; residual gas desorption; field emission; atmospheric pressure CVD; low pressure CVD; hybrid CVD; aerosol assisted CVD; pulsed CVD; perovskite photovoltaic nanomaterials; stabilization; structural design; performance optimization; solar cells; anatase single crystals; process-induced nanostructures; competitive growth; pp-MOCVD; vanadium pentoxide; electrochromic; spray pyrolysis; ammonium metavanadate; CVD; electrochromism; perovskite photovoltaic materials; TiO2; Al2O3; V2O5; computational fluid dynamics
• Online toegang: DOAB: download the publication; DOAB: description of the publication

Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-ru...