Advances in Chemical Vapor Deposition

• Other Authors: Vernardou, Dimitra (Editor)
• Format: Electronic Book Chapter
• Language: English
• Published: Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
• Subjects: Technology: general issues; APCVD; VO2; processing parameters; 2D; chemical vapor deposition; atomic layer deposition; aluminum oxide; aluminum tri-sec-butoxide; thin film; carbon nanotubes; residual gas adsorption; residual gas desorption; field emission; atmospheric pressure CVD; low pressure CVD; hybrid CVD; aerosol assisted CVD; pulsed CVD; perovskite photovoltaic nanomaterials; stabilization; structural design; performance optimization; solar cells; anatase single crystals; process-induced nanostructures; competitive growth; pp-MOCVD; vanadium pentoxide; electrochromic; spray pyrolysis; ammonium metavanadate; CVD; electrochromism; perovskite photovoltaic materials; TiO2; Al2O3; V2O5; computational fluid dynamics
• Online Access: DOAB: download the publication; DOAB: description of the publication

Summary

Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue "Advances in Chemical Vapor Deposition" is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.

Physical Description

1 electronic resource (94 p.)

ISBN

books978-3-03943-924-9
9783039439232
9783039439249

Access

Open Access