कवर छवि

Advances in Chemical Vapor Deposition

Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-ru...

पूर्ण विवरण

में बचाया:

ग्रंथसूची विवरण
अन्य लेखक:	Vernardou, Dimitra (संपादक)
स्वरूप:	इलेक्ट्रोनिक पुस्तक अध्याय
भाषा:	अंग्रेज़ी
प्रकाशित:	Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
विषय:	Technology: general issues APCVD VO2 processing parameters 2D chemical vapor deposition atomic layer deposition aluminum oxide aluminum tri-sec-butoxide thin film carbon nanotubes residual gas adsorption residual gas desorption field emission atmospheric pressure CVD low pressure CVD hybrid CVD aerosol assisted CVD pulsed CVD perovskite photovoltaic nanomaterials stabilization structural design performance optimization solar cells anatase single crystals process-induced nanostructures competitive growth pp-MOCVD vanadium pentoxide electrochromic spray pyrolysis ammonium metavanadate CVD electrochromism perovskite photovoltaic materials TiO2 Al2O3 V2O5 computational fluid dynamics
ऑनलाइन पहुंच:	DOAB: download the publication DOAB: description of the publication
टैग:	टैग जोड़ें कोई टैग नहीं, इस रिकॉर्ड को टैग करने वाले पहले व्यक्ति बनें!

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