Advances in Chemical Vapor Deposition

• その他の著者: Vernardou, Dimitra (編集者)
• フォーマット: 電子媒体 図書の章
• 言語: 英語
• 出版事項: Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
• 主題: Technology: general issues; APCVD; VO2; processing parameters; 2D; chemical vapor deposition; atomic layer deposition; aluminum oxide; aluminum tri-sec-butoxide; thin film; carbon nanotubes; residual gas adsorption; residual gas desorption; field emission; atmospheric pressure CVD; low pressure CVD; hybrid CVD; aerosol assisted CVD; pulsed CVD; perovskite photovoltaic nanomaterials; stabilization; structural design; performance optimization; solar cells; anatase single crystals; process-induced nanostructures; competitive growth; pp-MOCVD; vanadium pentoxide; electrochromic; spray pyrolysis; ammonium metavanadate; CVD; electrochromism; perovskite photovoltaic materials; TiO2; Al2O3; V2O5; computational fluid dynamics
• オンライン･アクセス: DOAB: download the publication; DOAB: description of the publication

Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-ru...