Atomic Layer Deposition
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...
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| Format: | Électronique Chapitre de livre |
| Langue: | anglais |
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Basel, Switzerland
MDPI - Multidisciplinary Digital Publishing Institute
2020
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| Accès en ligne: | DOAB: download the publication DOAB: description of the publication |
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DOAB: download the publicationDOAB: description of the publication
3rd Floor Main Library
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| Exemplaire 1 | Disponible |