Atomic Layer Deposition
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...
Bewaard in:
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| Formaat: | Elektronisch Hoofdstuk |
| Taal: | Engels |
| Gepubliceerd in: |
Basel, Switzerland
MDPI - Multidisciplinary Digital Publishing Institute
2020
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| Onderwerpen: | |
| Online toegang: | DOAB: download the publication DOAB: description of the publication |
| Tags: |
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Internet
DOAB: download the publicationDOAB: description of the publication
3rd Floor Main Library
| Plaatsingsnummer: |
A1234.567 |
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| Kopie 1 | Beschikbaar |