Atomic Layer Deposition
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...
Saved in:
| Other Authors: | |
|---|---|
| Format: | Electronic Book Chapter |
| Language: | English |
| Published: |
Basel, Switzerland
MDPI - Multidisciplinary Digital Publishing Institute
2020
|
| Subjects: | |
| Online Access: | DOAB: download the publication DOAB: description of the publication |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Be the first to leave a comment!