Chapter Spatial Atomic Layer Deposition
In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...
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| Hoofdauteur: | |
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| Andere auteurs: | , , , |
| Formaat: | Elektronisch Hoofdstuk |
| Taal: | Engels |
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InTechOpen
2019
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| Online toegang: | DOAB: download the publication DOAB: description of the publication |
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