Fundamentals and Recent Advances in Epitaxial Graphene on SiC

• Daljnji autori: Yakimova, Rositsa (Urednik), Shtepliuk, Ivan (Urednik)
• Format: Elektronički Poglavlje knjige
• Jezik: engleski
• Izdano: Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
• Teme: Technology: general issues; epitaxial graphene; copper; redox reaction; electrodeposition; voltammetry; chronoamperometry; DFT; silicon carbide; Raman spectroscopy; 2D peak line shape; G peak; charge density; strain; atomic layer deposition; high-k insulators; ion implantation; Raman; AFM; XPS; graphene; SiC; 3C-SiC on Si; substrate interaction; carrier concentration; mobility; intercalation; buffer layer; surface functionalization; twistronics; twisted bilayer graphene; flat band; epitaxial graphene on SiC; quasi-free-standing graphene; monolayer graphene; high-temperature sublimation; terahertz optical Hall effect; free charge carrier properties; sublimation; electronic properties; material engineering; deposition
• Online pristup: DOAB: download the publication; DOAB: description of the publication

Sažetak

This book is a compilation of recent studies by recognized experts in the field of epitaxial graphene working towards a deep comprehension of growth mechanisms, property engineering, and device processing. The results of investigations published within this book develop cumulative knowledge on matters related to device-quality epaxial graphene on SiC, bringing this material closer to realistic applications.

Opis fizičkog objekta

1 electronic resource (94 p.)

ISBN

books978-3-0365-1178-8
9783036511795
9783036511788

Pristup

Open Access