Nanoscale Self-Assembly: Nanopatterning and Metrology

• Andere auteurs: Ferrarese Lupi, Federico (Redacteur)
• Formaat: Elektronisch Hoofdstuk
• Taal: Engels
• Gepubliceerd in: Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
• Onderwerpen: Technology: general issues; block copolymer self-assembly; analytical ultracentrifugation; tannic acid; 3D printing; nano-resolution; arbitrary distribution; multimaterials; deposition surface; rapidity; large scale; conjugated polymers; polyfullerenes; processing by convective self-assembly; thin films and microstructure; photoluminescence quenching; block copolymers; self-assembly; polymer interface; nanostructure metrology; line edge roughness LER; (S)TEM; STEM-EELS of PS and PMMA; directed self-assembly; nanospheres lithography; colloidal nanospheres; direct laser-writing; directed self-assembly (DSA); block copolymers (BCPs); chemo-epitaxy; polystyrene-block-polymethylmethacrylate (PS-b-PMMA); line/space patterning; line edge roughness (LER); line width roughness (LWR); sequential infiltration synthesis; block copolymer; nanoparticles; colloidal clusters; colloidal molecules; sedimentation; separation; classification of nanoparticles; analytical centrifugation; differential centrifugal sedimentation; disk centrifuge; density gradient centrifugation
• Online toegang: DOAB: download the publication; DOAB: description of the publication

The self-assembly process underlies a plethora of natural phenomena from the macro to the nano scale. Often, technological development has found great inspiration in the natural world, as evidenced by numerous fabrication techniques based on self-assembly (SA). One striking example is given by epita...