Silicon Nanodevices

This book is a collection of scientific articles which brings research in Si nanodevices, device processing, and materials. The content is oriented to optoelectronics with a core in electronics and photonics. The issue of current technology developments in the nanodevices towards 3D integration and...

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Bibliographic Details
Other Authors: Radamson, Henry (Editor), Wang, Guilei (Editor)
Format: Electronic Book Chapter
Language:English
Published: Basel MDPI - Multidisciplinary Digital Publishing Institute 2022
Subjects:
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DOAB: description of the publication
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245 1 0 |a Silicon Nanodevices 
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520 |a This book is a collection of scientific articles which brings research in Si nanodevices, device processing, and materials. The content is oriented to optoelectronics with a core in electronics and photonics. The issue of current technology developments in the nanodevices towards 3D integration and an emerging of the electronics and photonics as an ultimate goal in nanotechnology in the future is presented. The book contains a few review articles to update the knowledge in Si-based devices and followed by processing of advanced nano-scale transistors. Furthermore, material growth and manufacturing of several types of devices are presented. The subjects are carefully chosen to critically cover the scientific issues for scientists and doctoral students. 
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650 7 |a Technology: general issues  |2 bicssc 
653 |a silicon 
653 |a yolk−shell structure 
653 |a anode 
653 |a lithium-ion batteries 
653 |a in-plane nanowire 
653 |a site-controlled 
653 |a epitaxial growth 
653 |a germanium 
653 |a nanowire-based quantum devices 
653 |a HfO2/Si0.7Ge0.3 gate stack 
653 |a ozone oxidation 
653 |a Si-cap 
653 |a interface state density 
653 |a passivation 
653 |a GOI 
653 |a photodetectors 
653 |a dark current 
653 |a responsivity 
653 |a prussian blue nanoparticles 
653 |a organotrialkoxysilane 
653 |a silica beads 
653 |a arsenite 
653 |a arsenate 
653 |a water decontamination 
653 |a vertical gate-all-around (vGAA) 
653 |a digital etch 
653 |a quasi-atomic-layer etching (q-ALE) 
653 |a selective wet etching 
653 |a HNO3 concentration 
653 |a doping effect 
653 |a vertical Gate-all-around (vGAA) 
653 |a p+-Ge0.8Si0.2/Ge stack 
653 |a dual-selective wet etching 
653 |a atomic layer etching (ALE) 
653 |a stacked SiGe/Si 
653 |a epitaxial grown 
653 |a Fin etching 
653 |a FinFET 
653 |a short-term potentiation (STP) 
653 |a long-term potentiation (LTP) 
653 |a charge-trap synaptic transistor 
653 |a band-to-band tunneling 
653 |a pattern recognition 
653 |a neural network 
653 |a neuromorphic system 
653 |a Si-MOS 
653 |a quantum dot 
653 |a spin qubits 
653 |a quantum computing 
653 |a GeSn 
653 |a CVD 
653 |a lasers 
653 |a detectors 
653 |a transistors 
653 |a III-V on Si 
653 |a heteroepitaxy 
653 |a threading dislocation densities (TDDs) 
653 |a anti-phase boundaries (APBs) 
653 |a selective epitaxial growth (SEG) 
653 |a n/a 
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