Development of Autopolymerizing Resin Material with Antimicrobial Properties Using Montmorillonite and Nanoporous Silica

• Main Authors: Shuhei Otsubo (Author), Ko Nakanishi (Author), Kakufu Fukukawa (Author), Ryoshun Endo (Author), Seiichiro Yoshida (Author), Aiko Matsumoto (Author), Kumiko Yoshihara (Author), Tsukasa Akasaka (Author), Akira Hasebe (Author), Yasuhiro Yoshida (Author), Yoshiaki Sato (Author)
• Format: Book
• Published: MDPI AG, 2023-02-01T00:00:00Z.
• Subjects: article
• Online Access: Connect to this object online.

Although autopolymerizing resin offers numerous applications in orthodontic treatment, plaque tends to accumulate between the appliance and the mucosa, which increases the number of microorganisms present. In this study, we added cetylpyridinium chloride (CPC) loaded montmorillonite (Mont) and nanop...