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Chapter Spatial Atomic Layer Deposition

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In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...

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Detalhes bibliográficos
Autor principal: Jiménez, Carmen (auth)
Outros Autores: Bellet, Daniel (auth), Masse de la Huerta, César (auth), Muñoz-Rojas, David (auth), Huong Nguyen, Viet (auth)
Formato: Recurso Electrónico Capítulo de Livro
Idioma:inglês
Publicado em: InTechOpen 2019
Assuntos:
Materials science
chemical vapor deposition, spatial atomic layer deposition (SALD), atmospheric pressure, in-line processing, thin films, transparent conductive materials, fluid dynamics
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