Chapter Spatial Atomic Layer Deposition

In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...

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Bibliografske podrobnosti
Glavni avtor: Jiménez, Carmen (auth)
Drugi avtorji: Bellet, Daniel (auth), Masse de la Huerta, César (auth), Muñoz-Rojas, David (auth), Huong Nguyen, Viet (auth)
Format: Elektronski Book Chapter
Jezik:angleščina
Izdano: InTechOpen 2019
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Online dostop:OAPEN Library: download the publication
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