Chapter Spatial Atomic Layer Deposition
In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...
Shranjeno v:
Glavni avtor: | |
---|---|
Drugi avtorji: | , , , |
Format: | Elektronski Book Chapter |
Jezik: | angleščina |
Izdano: |
InTechOpen
2019
|
Teme: | |
Online dostop: | OAPEN Library: download the publication OAPEN Library: description of the publication |
Oznake: |
Označite
Brez oznak, prvi označite!
|
Internet
OAPEN Library: download the publicationOAPEN Library: description of the publication
3rd Floor Main Library
Signatura: |
A1234.567 |
---|---|
Kopija 1 | Prosto |