Chapter Spatial Atomic Layer Deposition
In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...
Saved in:
| Main Author: | |
|---|---|
| Other Authors: | , , , |
| Format: | Electronic Book Chapter |
| Language: | English |
| Published: |
InTechOpen
2019
|
| Subjects: | |
| Online Access: | OAPEN Library: download the publication OAPEN Library: description of the publication |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|