Chapter Spatial Atomic Layer Deposition

In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...

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Xehetasun bibliografikoak
Egile nagusia: Jiménez, Carmen (auth)
Beste egile batzuk: Bellet, Daniel (auth), Masse de la Huerta, César (auth), Muñoz-Rojas, David (auth), Huong Nguyen, Viet (auth)
Formatua: Baliabide elektronikoa Liburu kapitulua
Hizkuntza:ingelesa
Argitaratua: InTechOpen 2019
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Sarrera elektronikoa:OAPEN Library: download the publication
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