Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata

PZT films were prepared on Pt/Ti/SiO2/Si substrate by RF reactive sputtering apparatus using metal-oxide composite ZrTi+PbO2 powder and pellet targets. The main sputtering conditions are as follows: sputtering gas is argon and oxygen, gas pressure is 1810-2Torr, 02/Ar flow rate is 0% and 4.2%, subst...

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Váldodahkkit: Herman, Sukreen Hana (Dahkki), Kimihiro, Sasaki (Dahkki), Tomonobu, Hata (Dahkki)
Materiálatiipa: Girji
Almmustuhtton: 2004.
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