Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata

• Главные авторы: Herman, Sukreen Hana (Автор), Kimihiro, Sasaki (Автор), Tomonobu, Hata (Автор)
• Формат: ‌
• Опубликовано: 2004.
• Предметы: Conference or Workshop Item; PeerReviewed
• Online-ссылка: Link Metadata

PZT films were prepared on Pt/Ti/SiO2/Si substrate by RF reactive sputtering apparatus using metal-oxide composite ZrTi+PbO2 powder and pellet targets. The main sputtering conditions are as follows: sputtering gas is argon and oxygen, gas pressure is 1810-2Torr, 02/Ar flow rate is 0% and 4.2%, subst...