Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata
PZT films were prepared on Pt/Ti/SiO2/Si substrate by RF reactive sputtering apparatus using metal-oxide composite ZrTi+PbO2 powder and pellet targets. The main sputtering conditions are as follows: sputtering gas is argon and oxygen, gas pressure is 1810-2Torr, 02/Ar flow rate is 0% and 4.2%, subst...
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| Materiálatiipa: | Girji |
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2004.
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| Njađus 1 | Oažžumis |