Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata

• প্রধান লেখক: Herman, Sukreen Hana (লেখক), Kimihiro, Sasaki (লেখক), Tomonobu, Hata (লেখক)
• বিন্যাস: গ্রন্থ
• প্রকাশিত: 2004.
• বিষয়গুলি: Conference or Workshop Item; PeerReviewed
• অনলাইন ব্যবহার করুন: Link Metadata

PZT films were prepared on Pt/Ti/SiO2/Si substrate by RF reactive sputtering apparatus using metal-oxide composite ZrTi+PbO2 powder and pellet targets. The main sputtering conditions are as follows: sputtering gas is argon and oxygen, gas pressure is 1810-2Torr, 02/Ar flow rate is 0% and 4.2%, subst...