Micro- and Nano-Fabrication by Metal Assisted Chemical Etching
Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates-Si, Ge, poly-Si, GaAs, and SiC-and using different catalysts-Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes...
Sábháilte in:
Rannpháirtithe: | |
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Formáid: | Leictreonach Caibidil leabhair |
Teanga: | Béarla |
Foilsithe / Cruthaithe: |
Basel, Switzerland
MDPI - Multidisciplinary Digital Publishing Institute
2021
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Ábhair: | |
Rochtain ar líne: | DOAB: download the publication DOAB: description of the publication |
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Achoimre: | Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates-Si, Ge, poly-Si, GaAs, and SiC-and using different catalysts-Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale-nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications. |
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Cur síos fisiciúil: | 1 electronic resource (106 p.) |
ISBN: | books978-3-03943-846-4 9783039438457 9783039438464 |
Rochtain: | Open Access |