Atomic Layer Deposition
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...
Tallennettuna:
| Muut tekijät: | |
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| Aineistotyyppi: | Elektroninen Kirjan osa |
| Kieli: | englanti |
| Julkaistu: |
Basel, Switzerland
MDPI - Multidisciplinary Digital Publishing Institute
2020
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| Aiheet: | |
| Linkit: | DOAB: download the publication DOAB: description of the publication |
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