Chapter Spatial Atomic Layer Deposition

Chapter Spatial Atomic Layer Deposition

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In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...

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Bibliographic Details
Main Author: Jiménez, Carmen (auth)
Other Authors: Bellet, Daniel (auth), Masse de la Huerta, César (auth), Muñoz-Rojas, David (auth), Huong Nguyen, Viet (auth)
Format: Electronic Book Chapter
Language:English
Published: InTechOpen 2019
Subjects:
Materials science
chemical vapor deposition, spatial atomic layer deposition (SALD), atmospheric pressure, in-line processing, thin films, transparent conductive materials, fluid dynamics
Online Access:DOAB: download the publication
DOAB: description of the publication
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