Chapter Spatial Atomic Layer Deposition
In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...
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| フォーマット: | 電子媒体 図書の章 |
| 言語: | 英語 |
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InTechOpen
2019
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