Chapter Spatial Atomic Layer Deposition

In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...

Volledige beschrijving

Bewaard in:

Bibliografische gegevens
Hoofdauteur:	Jiménez, Carmen (auth)
Andere auteurs:	Bellet, Daniel (auth), Masse de la Huerta, César (auth), Muñoz-Rojas, David (auth), Huong Nguyen, Viet (auth)
Formaat:	Elektronisch Hoofdstuk
Taal:	Engels
Gepubliceerd in:	InTechOpen 2019
Onderwerpen:	Materials science chemical vapor deposition, spatial atomic layer deposition (SALD), atmospheric pressure, in-line processing, thin films, transparent conductive materials, fluid dynamics
Online toegang:	OAPEN Library: download the publication OAPEN Library: description of the publication
Tags:	Voeg label toe Geen labels, Wees de eerste die dit record labelt!

Wees de eerste die reageert!

Chapter Spatial Atomic Layer Deposition

Gelijkaardige items